Schefske, J. : rechercher sur Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - EUV resist performance: current assessment for sub-22-nm half-pitch patterning on NXE:3300

Wallow, T., Civay, D., Wang, S., Hoefnagels, H. F., Verspaget, C., Tanriseven, G., Fumar-Pici, A., Hansen, S., Schefske, J., Singh, M., Maas, R., van Dommelen, Y., Mallman, J., Naulleau, Patrick P., W

Année:

2012

Langue:

english

Fichier:

PDF, 2.02 MB

english, 2012

2

Characterizing the Nutrient and Calorie Content of Home Food Supplies Using Mobile Universal Product Code (UPC) Scanning Technology

C. Byrd-Bredbenner, S. Schefske, C. Cuite, W. Hallman

Journal:

Journal of the American Dietetic Association

Année:

2009

Langue:

english

Fichier:

PDF, 82 KB

english, 2009

3

Using UPC Scanning Methods to Characterize Household Food Supplies of Multi-Ethnic Low Income Minorities

S.D. Schefske, C. Byrd-Bredbenner, C. Cuite, W.K. Hallman

Journal:

Journal of the American Dietetic Association

Année:

2010

Langue:

english

Fichier:

PDF, 72 KB

english, 2010

4

A Polytheoretical Framework for Behavioral Nutrition Education

Kirsten W. Corda, Virginia Quick, Carolina Espinosa, Deepika Bangia, Scott Schefske, Joanne DeCandia, Carol Byrd-Bredbenner, Maria Courel, Jonathan M. Brown

Journal:

Journal of Nutrition Education and Behavior

Année:

2009

Langue:

english

Fichier:

PDF, 48 KB

english, 2009

5

Nutrient analysis of varying socioeconomic status home food environments in New Jersey

Scott D. Schefske, Anne C. Bellows, Carol Byrd-Bredbenner, Cara L. Cuite, Holly Rapport, Teresa Vivar, William K. Hallman

Journal:

Année:

2010

Langue:

english

Fichier:

PDF, 180 KB

english, 2010

6

Characterization of the manufacturability of ultrathin resist

K. B. Nguyen, C. Lyons, J. Schefske, C. Pike, K. Phan, P. King, H. Levinson, S. Bell, U. Okoroanyanwu

Année:

1999

Langue:

english

Fichier:

PDF, 628 KB

english, 1999

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Revisit pattern collapse for 14nm node and beyond

Yoshimoto, Kenji, Allen, Robert D., Somervell, Mark H., Higgins, Craig, Raghunathan, Ananthan, Hartley, John G., Goldfarb, Dario L., Kato, Hirokazu, Petrillo, Karen, Colburn, Matthew E., Schefske, Jef

Année:

2011

Langue:

english

Fichier:

PDF, 1.40 MB

english, 2011

8

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Characterization and applications of an in-scanner aerial image detection system

Hunsche, S., Archie, Chas N., Gassner, M. J., Schefske, J. A., Kent, E. R., Acheta, A.

Année:

2006

Langue:

english

Fichier:

PDF, 489 KB

english, 2006

9

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Integration considerations for 130-nm device patterning using ArF lithography

Okoroanyanwu, Uzodinma, Levinson, Harry J., Yang, Chih-Yuh, Pangrle, Suzette K., Schefske, Jeff A., Kent, Eric, Progler, Christopher J.

Année:

2000

Langue:

english

Fichier:

PDF, 2.47 MB

english, 2000

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Advanced modeling strategies to improve overlay control for 32-nm lithography processes

Minvielle, Anna, Allgair, John A., Raymond, Christopher J., Singh, Lovejeet, Schefske, Jeffrey, Reiss, Joerg, Kent, Eric, Manchester, Terry, Eichelberger, Brad, O'Brien, Kelly, Manka, Jim, Robinson, J

Année:

2009

Langue:

english

Fichier:

PDF, 289 KB

english, 2009

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - 32nm overlay improvement capabilities

Eichelberger, Brad, Huang, Kevin, O'Brien, Kelly, Tien, David, Tsai, Frank, Minvielle, Anna, Singh, Lovejeet, Schefske, Jeffrey

Année:

2008

Langue:

english

Fichier:

PDF, 307 KB

english, 2008

12

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - ArF lithography: challenges, resolution capability, and the mask error enhancement function (MEEF)

Plat, Marina V., Lyons, Christopher F., Wilkison, Amada, Schefske, Jeff A., Kim, Hung-Eil, Mack, Chris A., Stevenson, Tom

Année:

2001

Langue:

english

Fichier:

PDF, 339 KB

english, 2001

13

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Issues and nonissues on a 193-nm step-and-scan system in production

Schefske, Jeff A., Kent, Eric, Okoroanyanwu, Uzodinma, Levinson, Harry J., Masud, Charles R., Streefkerk, Bob, Hanzen, Ralph M., Brueback, Joerg, Progler, Christopher J.

Année:

2000

Langue:

english

Fichier:

PDF, 1.41 MB

english, 2000

14

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Defect printability for sub-0.18-micron design rules using 193-nm lithography process and binary OPC reticle

Phan, Khoi A., Spence, Chris A., Schefske, Jeff A., Okoroanyanwu, Uzodinma, Levinson, Harry J., Sullivan, Neal T.

Année:

2000

Langue:

english

Fichier:

PDF, 3.27 MB

english, 2000